ACM provides Hexagonal Boron Nitride Film (h-BN Film) on copper foil. Copper-based HBN films are deposited by chemical vapor deposition (CVD) on high-purity copper foils with single-layer and multi-layer h-BN films. Single-layer h-BN (Boron Nitride) monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct bandgap of 6 eV with strong ionic bonding between B-N atoms.
Type | Substrate: copper foil. |
Size (mm) | 5*10, 10*10, 10*20 |
Crystal Structure | Hexagonal Phase |
Method | Chemical Vapor Deposition (CVD) |
* Plasma arc welding applications
* Semiconductor crystal growth equipment and processing
Our Hexagonal Boron Nitride Film (h-BN Film) is carefully handled during storage and transportation to preserve the quality of our product in its original condition.